Chinese invention patent: Photoinduced-deformation high polymer material based on triplet state-triplet state annihilation up-conversion luminescence

Inventor: Yanlei Yu, Fuyou Li, Zhen Jiang, Ming Xu

Applicant: Fudan University

Patent No.: ZL 201310419733.4

Abstract：

The invention belongs to the filed of photoresponse high polymer materials and particularly relates to a photoinduced-deformation high polymer material based on a triplet state-triplet state annihilation up-conversion luminescence mechanism. The material is composed of liquid crystal polymers containing azo phenyl groups and up-conversion luminescent materials based on triplet state-triplet state annihilation. The liquid crystal polymers containing the azo phenyl groups do not have the stimulation responsiveness on long-wavelength visible light or near-infrared light. The up-conversion luminescent materials of triplet state-triplet state annihilation are introduced in the material system preparing process, short-wave visible light enabling the azo phenyl groups to have the stimulation response is generated in the up-conversion process, and therefore a whole material system can deform under irradiation of the long-wavelength visible light or the near-infrared light. The long-wavelength visible light or the near-infrared light drives the material system so as to promote application of the photoinduced-deformation high polymer material in field of biochips, aspects of micro executing devices and the like.